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High density and long retention non-destructive readout FeRAM using a linked cell architecture

Authors :
Shimada, Y.
Kato, Y.
Yamada, T.
Tanaka, K.
Otsuki, T.
Chen, Z.
Lim, M.
Joshi, V.
Mcmillan, L.
De Araujo, C. A. Paz
Source :
Integrated Ferroelectrics; January 2001, Vol. 40 Issue: 1 p41-54, 14p
Publication Year :
2001

Abstract

A 64 Kbit non-destructive readout (NDRO) ferroelectric random access memory (FeRAM) using a 0.6-μm technology is described. The NDRO FeRAM uses a novel linked cell architecture, which minimizes the circuit overhead accepted in Flash memories. This test device has shown 10-year retention and unlimited read operation. An 120-ns NDRO operation is performed at a read voltage of 2.2V. Circuit techniques used in the NDRO FeRAM include: (1) direct programming of ferroelectric capacitors, (2) automatic restoring of read data, and (3) data storing under zero bias conditions. The unique linked cell architecture allows for scaling a cell size down to 6F2, where F is the minimum feature size available.

Details

Language :
English
ISSN :
10584587 and 16078489
Volume :
40
Issue :
1
Database :
Supplemental Index
Journal :
Integrated Ferroelectrics
Publication Type :
Periodical
Accession number :
ejs11372824
Full Text :
https://doi.org/10.1080/10584580108010828