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Computer simulation of interdiffusion in polycrystalline thin film couples

Authors :
Wagendristel, A.
Tschegg, E.
Semerad, E.
Bangert, H.
Source :
Applied Physics A: Materials Science & Processing; July 1976, Vol. 10 Issue: 3 p237-243, 7p
Publication Year :
1976

Abstract

Abstract: Computer simulation of superimposed lattice, grain boundary and surface diffusion, characteristic for polycrystalline thin film diffusion systems, was performed by way of discretisation of the nonlinear diffusion law. In order to give a vivid impression how such a complex process takes place under some typical conditions we have chosen pseudo three-dimensional computer plots of the spacial distribution of the concentration instead of the commonly used iso-concentration diagrams. The following cases are considered: <table><tr><td>a) </td><td> Polycristal — single crystal couple with highly diffusive grain boundaries and surfaces, grain boundaries and interface, grain boundaries, surfaces and interface. </td></tr><tr><td>b) </td><td> Polycrystal — polycrystal couple with different displaced grain boundaries as well as different diffusivity ratios for the bulk and the highly conducting regions. </td></tr></table>

Details

Language :
English
ISSN :
09478396 and 14320630
Volume :
10
Issue :
3
Database :
Supplemental Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Periodical
Accession number :
ejs15636925
Full Text :
https://doi.org/10.1007/BF00897222