Sub-100nm Hybrid Stamp Fabrication by Hot Embossing

The fabrication of nano-structured materials using nanoimprint lithography has become more prevalent in recent years, due to its cost effectiveness and readiness. However, One of the biggest drawback of this technique is the fabrication of the imprinting stamp, which is expensive and difficult to fabricate. This paper describes a method of replication original Si or quartz made imprinting template into a polymer stamp which has many advantages, such as the simplicity and low cost of the fabrication process and the flexibility of the resulting stamp. Using the hot embossing method, PVC based imprint stamp with sub 100nm patterns can be fabricated. Due to its high UV transmittance, reasonable mechanical hardness and low surface energy, PVC based nanosized template can be used as a stamp for UV-NIL and sub 100nm patterns were successfully transferred by the UV-NIL process with PVC based imprint stamp.