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Diffusion of Ti, V and Nb in Ni3Al at Elevated Temperatures

Authors :
Fukaya, Haruhiko
Moniruzzaman, Md.
Murata, Yoshinori
Morinaga, Masahiko
Koyama, Toshiyuki
Hashimoto, W.
Tanaka, K.
Inui, Haruyuki
Source :
Diffusion and Defect Data Part A: Defect and Diffusion Forum; April 2010, Vol. 297 Issue: 1 p384-389, 6p
Publication Year :
2010

Abstract

Interdiffusion coefficients of Al replacing elements in Ni-Al-X (X=Ti, V and Nb) were estimated by a series of experiments using diffusion couples of Al rich pseudo-binary systems at three different temperatures of 1423, 1473 and 1523K. In order to obtain interdiffusion coefficients of the pseudo-binary systems, the experimental data was analyzed by the Sauer and Freise method, and also impurity diffusion coefficients of Ti, V and Nb in Ni3Al were estimated by applying the Darken-Manning equation. The magnitude of interdiffusion coefficient decreased in order of V, Ti and Nb at all three temperatures. Impurity diffusion coefficients were described by the expressions: , , . The activation enthalpies obtained from the experimental data confirmed the retardation of Ti, V and Nb diffusion in Ni3Al by the anti-site diffusion mechanism. These results are consistent with our previous work on diffusion of Re and Ru in Ni3Al .

Details

Language :
English
ISSN :
10120386 and 16629507
Volume :
297
Issue :
1
Database :
Supplemental Index
Journal :
Diffusion and Defect Data Part A: Defect and Diffusion Forum
Publication Type :
Periodical
Accession number :
ejs21141481
Full Text :
https://doi.org/10.4028/www.scientific.net/DDF.297-301.384