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Diffusion of Ti, V and Nb in Ni3Al at Elevated Temperatures
- Source :
- Diffusion and Defect Data Part A: Defect and Diffusion Forum; April 2010, Vol. 297 Issue: 1 p384-389, 6p
- Publication Year :
- 2010
-
Abstract
- Interdiffusion coefficients of Al replacing elements in Ni-Al-X (X=Ti, V and Nb) were estimated by a series of experiments using diffusion couples of Al rich pseudo-binary systems at three different temperatures of 1423, 1473 and 1523K. In order to obtain interdiffusion coefficients of the pseudo-binary systems, the experimental data was analyzed by the Sauer and Freise method, and also impurity diffusion coefficients of Ti, V and Nb in Ni3Al were estimated by applying the Darken-Manning equation. The magnitude of interdiffusion coefficient decreased in order of V, Ti and Nb at all three temperatures. Impurity diffusion coefficients were described by the expressions: , , . The activation enthalpies obtained from the experimental data confirmed the retardation of Ti, V and Nb diffusion in Ni3Al by the anti-site diffusion mechanism. These results are consistent with our previous work on diffusion of Re and Ru in Ni3Al .
Details
- Language :
- English
- ISSN :
- 10120386 and 16629507
- Volume :
- 297
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Diffusion and Defect Data Part A: Defect and Diffusion Forum
- Publication Type :
- Periodical
- Accession number :
- ejs21141481
- Full Text :
- https://doi.org/10.4028/www.scientific.net/DDF.297-301.384