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RHEED studies of MnF2epitaxial growth on Si(111) substrates

Authors :
Yakovlev, N. L.
Banshchikov, A. G.
Moisseeva, M. M.
Sokolov, N. S.
Beeby, J. L.
Maksym, P. A.
Source :
Surface and Interface Analysis; August 1999, Vol. 28 Issue: 1 p264-266, 3p
Publication Year :
1999

Abstract

Molecular beam epitaxy was used to grow MnF2films on a Si(111) substrate with a thin CaF2buffer at room temperature. It was found that films thinner than three molecular layers have a cubic fluorite crystal structure inherited from CaF2. The MnF2film is coherent to the substrate and has an interlayer spacing of 0.305 ± 0.005 nm, which is 3% less than for bulk CaF2. Thicker films have the tetragonal rutile structure, so the film surface is the (110) plane of MnF2with its [001] axis parallel to 〈110〉 directions of the substrate. Copyright © 1999 John Wiley & Sons, Ltd.

Details

Language :
English
ISSN :
01422421 and 10969918
Volume :
28
Issue :
1
Database :
Supplemental Index
Journal :
Surface and Interface Analysis
Publication Type :
Periodical
Accession number :
ejs24964587
Full Text :
https://doi.org/10.1002/(SICI)1096-9918(199908)28:1<264::AID-SIA590>3.0.CO;2-#