Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

MLA

Liu, X., et al. “Electron Beam Lithography of Phase Mask Gratings for near Field Holographic Production of Optical Fibre Gratings.” Microelectronic Engineering, vol. 35, no. 1, Jan. 1997, pp. 345–48. EBSCOhost, https://doi.org/10.1016/S0167-9317(96)00102-5.

APA

Liu, X., Aitchison, J. S., Rue, R. M. D. L., Thoms, S., Zhang, L., Williams, J. A. R., & Bennion, I. (1997). Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings. Microelectronic Engineering, 35(1), 345–348. https://doi.org/10.1016/S0167-9317(96)00102-5

Chicago

Liu, X., J. S. Aitchison, R. M. De La Rue, S. Thoms, L. Zhang, J. A. R. Williams, and I. Bennion. 1997. “Electron Beam Lithography of Phase Mask Gratings for near Field Holographic Production of Optical Fibre Gratings.” Microelectronic Engineering 35 (1): 345–48. doi:10.1016/S0167-9317(96)00102-5.