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Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films

Authors :
Fukuda, H.
Kobayashi, T.
Endoh, T.
Nomura, S.
Sakai, A.
Ueda, Y.
Source :
Applied Surface Science; 1998, Vol. 130 Issue: 1 p776-780, 5p
Publication Year :
1998

Details

Language :
English
ISSN :
01694332
Volume :
130
Issue :
1
Database :
Supplemental Index
Journal :
Applied Surface Science
Publication Type :
Periodical
Accession number :
ejs2989369
Full Text :
https://doi.org/10.1016/S0169-4332(98)00153-6