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The importance of lithography and advanced etch techniques for nanofabrication of MOS capacitor with HfO2
- Source :
- Proceedings of SPIE; March 2013, Vol. 8685 Issue: 1 p86850W-86850W-4, 781655p
- Publication Year :
- 2013
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 8685
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs31091910
- Full Text :
- https://doi.org/10.1117/12.2020003