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Anisotropic etching of silicon in a complexant redox alkaline system
- Source :
- Sensors and Actuators B: Chemical; 1999, Vol. 58 Issue: 1 p438-449, 12p
- Publication Year :
- 1999
Details
- Language :
- English
- ISSN :
- 09254005
- Volume :
- 58
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Sensors and Actuators B: Chemical
- Publication Type :
- Periodical
- Accession number :
- ejs3438462
- Full Text :
- https://doi.org/10.1016/S0925-4005(99)00124-0