Vapor Annealing and Colloid Lithography: An Effective Tool To Control Spatial Resolution of Surface Modification

MLA

Miliutina, E., et al. “Vapor Annealing and Colloid Lithography: An Effective Tool To Control Spatial Resolution of Surface Modification.” Langmuir, vol. 34, no. 43, Oct. 2018, pp. 12861–69. EBSCOhost, https://doi.org/10.1021/acs.langmuir.8b02025.

APA

Miliutina, E., Guselnikova, O., Marchuk, V., Elashnikov, R., Burtsev, V., Postnikov, P., Svorcik, V., & Lyutakov, O. (2018). Vapor Annealing and Colloid Lithography: An Effective Tool To Control Spatial Resolution of Surface Modification. Langmuir, 34(43), 12861–12869. https://doi.org/10.1021/acs.langmuir.8b02025

Chicago

Miliutina, E., O. Guselnikova, V. Marchuk, R. Elashnikov, V. Burtsev, P. Postnikov, V. Svorcik, and O. Lyutakov. 2018. “Vapor Annealing and Colloid Lithography: An Effective Tool To Control Spatial Resolution of Surface Modification.” Langmuir 34 (43): 12861–69. doi:10.1021/acs.langmuir.8b02025.