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Studying resist performance for contact holes printing using EUV interference lithography

Authors :
Ronse, Kurt G.
Hendrickx, Eric
Naulleau, Patrick P.
Gargini, Paolo A.
Itani, Toshiro
Wang, Xiaolong
Tseng, Li-Ting
Kazazis, Dimitrios
Tasdemir, Zuhal
Vockenhuber, Michaela
Mochi, Iacopo
Ekinci, Yasin
Source :
Proceedings of SPIE; October 2018, Vol. 10809 Issue: 1 p108091Z-108091Z-13, 10701023p
Publication Year :
2018

Details

Language :
English
ISSN :
0277786X
Volume :
10809
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs47284578
Full Text :
https://doi.org/10.1117/12.2501949