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Effect of Carrier Waveform Frequency on the Microstructure of Al2O3 Plasma Electrolyic Oxidation Films
- Source :
- ECS Electrochemistry Letters (EEL); January 2013, Vol. 2 Issue: 4 pC11-C14, 4p
- Publication Year :
- 2013
-
Abstract
- Different microstructures of the Al2O3 plasma electrolytic oxidation (PEO) films were obtained by controlling the frequency of applied high-frequency square voltage waveform (HFSVW) under different transient self-feedback control (TSFC). The morphology and compactness of the PEO films were characterized by scanning electron microscopy (SEM) and electrochemical impedance spectroscopy (EIS). Experimental results indicated that uniform, compact, small-grained TSFC PEO films can be produced by applying high-frequency HFSVWs.
Details
- Language :
- English
- ISSN :
- 21628726 and 21628734
- Volume :
- 2
- Issue :
- 4
- Database :
- Supplemental Index
- Journal :
- ECS Electrochemistry Letters (EEL)
- Publication Type :
- Periodical
- Accession number :
- ejs52666788