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The application of a new stochastic search algorithm “Adam” in inverse lithography technology (ILT) in critical recording head fabrication process

Authors :
Owa, Soichi
Phillips, Mark C.
Yu, Dan
Liu, Yi
Hawkinson, Chuck
Source :
Proceedings of SPIE; March 2021, Vol. 11613 Issue: 1 p116130N-116130N-8, 1045179p
Publication Year :
2021

Details

Language :
English
ISSN :
0277786X
Volume :
11613
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs56046658
Full Text :
https://doi.org/10.1117/12.2583508