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Hardness and Structure of a-CNxFilms Synthesized by Chemical Vapor Deposition

Authors :
Daisuke Tanaka, Daisuke Tanaka
Yoshiaki Ohkawara, Yoshiaki Ohkawara
Noriko Itoh, Noriko Itoh
Shigeo Ohshio, Shigeo Ohshio
Haruhiko Ito, Haruhiko Ito
Hidetoshi Saitoh, Hidetoshi Saitoh
Source :
Japanese Journal of Applied Physics; July 2000, Vol. 39 Issue: 7 p4148-4148, 1p
Publication Year :
2000

Abstract

Mechanically hard a-CNxfilms were synthesized using a combination of ion bombardment and the chemical vapor deposition process using the dissociative excitation reaction of BrCN with Ar metastable atoms. Nanoindentation tests disclosed that the indentation hardness, Young's modulus and elastic recovery increased with increasing ion-accelerating voltage. Moreover, the degree of flow among clusters decreased in the ion-bombarded sample. The D (disordered)-band absorption on an infrared absorption spectrum was replaced by a C-N absorption assigned to the tertiary aromatic amine. These results suggest that the internal and external structures of the carbon nitride cluster change from the two-dimensional order to the three-dimensional order of C-N. The structure of hard a-CNxis clearly distinguishable from nitrogen-containing diamond-like carbon.

Details

Language :
English
ISSN :
00214922 and 13474065
Volume :
39
Issue :
7
Database :
Supplemental Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Periodical
Accession number :
ejs56136950
Full Text :
https://doi.org/10.1143/JJAP.39.4148