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Optimized temporal energy deposition for advanced processing of Si and SiC based on highly flexible TruMicro series 2000
- Source :
- Proceedings of SPIE; March 2021, Vol. 11673 Issue: 1 p116730A-116730A-10, 11556281p
- Publication Year :
- 2021
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 11673
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs56468935
- Full Text :
- https://doi.org/10.1117/12.2577590