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Lithographic exposure latitude aware source and mask optimization
- Source :
- Proceedings of SPIE; December 2021, Vol. 12073 Issue: 1 p1207302-1207302-7
- Publication Year :
- 2021
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12073
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs58836870
- Full Text :
- https://doi.org/10.1117/12.2604844