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Pattern customization on 193 immersion lithography by negative tone development process and multiple exposures
- Source :
- Proceedings of SPIE; June 2022, Vol. 12051 Issue: 1 p120510Q-120510Q-8, 1084599p
- Publication Year :
- 2022
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12051
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs60335316
- Full Text :
- https://doi.org/10.1117/12.2614018