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Back-Channel-Etched Oxide Thin Film Transistors with a Corrosion Resistant Crystalline InGaO Channel
- Source :
- ECS Journal of Solid State Science and Technology; January 2019, Vol. 8 Issue: 4
- Publication Year :
- 2019
-
Abstract
- A crystalline indium-gallium-oxide (InGaO) was used as the channel of a thin film transistor (TFT) with back-channel-etched (BCE) structure. The effects of deposition temperature (T) on crystal structure, morphology, electrical properties and corrosion resistance of InGaO films were studied in detail. X-ray diffraction spectra and scan electron microscopy reveal that the slight increase in corrosion resistance with Tat 25–200°C results from the discrete crystallites embedded amorphous network while the massive increase at 290°C results from the high crystallinity of the film. The carrier concentration (Nc) and mobility of InGaO films show a huge increase as Tincreases due to the crystallization process at 25–200°C, but they change very little when the films are highly crystallized at 290°C. The BCE TFT exhibits a slightly higher saturated mobility of 11.9 cm2/(V·s), a more positive threshold voltage of −0.43 V, a larger subthreshold swing of 0.37 V/decade and a higher off-current of 4 pA when compared with the TFT fabricated by a lift-off process. Combined with X-Ray Photoelectron Spectroscopy analysis, the BCE process causes an oxygen-deficient back channel and introduces deep trap states, leading to the deterioration in electrical performance.
Details
- Language :
- English
- ISSN :
- 21628769 and 21628777
- Volume :
- 8
- Issue :
- 4
- Database :
- Supplemental Index
- Journal :
- ECS Journal of Solid State Science and Technology
- Publication Type :
- Periodical
- Accession number :
- ejs61800077
- Full Text :
- https://doi.org/10.1149/2.0191904jss