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New functional surface treatment process and primers for high-NA EUV lithography

Authors :
Guerrero, Douglas
Amblard, Gilles R.
Shibayama, Wataru
Shigaki, Shuhei
Takeda, Satoshi
Kato, Kodai
Nakajima, Makoto
Sakamoto, Rikimaru
Source :
Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124980O-124980O-10, 12373031p
Publication Year :
2023

Details

Language :
English
ISSN :
0277786X
Volume :
12498
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs63131815
Full Text :
https://doi.org/10.1117/12.2659979