Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography

MLA

Guerrero, Douglas, et al. “Chemical Trimming Overcoat: An Advanced Spin-on Process for Photoresist Enhancement in EUV Lithography.” Proceedings of SPIE, vol. 12498, no. 1, May 2023, p. 124980Q–124980Q–8. EBSCOhost, https://doi.org/10.1117/12.2658882.

APA

Guerrero, D., Amblard, G. R., Hou, X., Cen, Y., Baranowsky, P., Kang, D., Liu, C., & Xu, C. (2023). Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography. Proceedings of SPIE, 12498(1), 124980Q–124980Q–8. https://doi.org/10.1117/12.2658882

Chicago

Guerrero, Douglas, Gilles R. Amblard, Xisen Hou, Yinjie Cen, Paul Baranowsky, Doris Kang, Cong Liu, and Chengbai Xu. 2023. “Chemical Trimming Overcoat: An Advanced Spin-on Process for Photoresist Enhancement in EUV Lithography.” Proceedings of SPIE 12498 (1): 124980Q–124980Q–8. doi:10.1117/12.2658882.