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Fabrication of CoFeB–SiO2 Films With Large Uniaxial Anisotropy by Facing Target Sputtering and its Application to High-Frequency Planar-Type Spiral Inductors
- Source :
- IEEE Transactions on Magnetics; November 2023, Vol. 59 Issue: 11 p1-4, 4p
- Publication Year :
- 2023
-
Abstract
- A comprehensive study on fabrication of CoFeB–SiO2 films with large in-plane magnetic anisotropy for the use in high-frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering (FTS), which can introduce large uniaxial magnetic anisotropy in the plane. A multilayer structure consisting of CoFeB–SiO2 and SiO2 layers suppressed columnar growth and thus reduced undesired perpendicular magnetic anisotropy (PMA). As a result, a <inline-formula> <tex-math notation="LaTeX">$1 ~\mu \text{m}$ </tex-math></inline-formula>-thick magnetic layer was achieved with excellent soft-magnetic properties and no stripe domain structure. The effectiveness of these magnetic films was demonstrated by fabricating and characterizing planar-type spiral coils. This development of micromagnetic inductors using the magnetic layer shows great potential for use in high-frequency power electronics applications.
Details
- Language :
- English
- ISSN :
- 00189464
- Volume :
- 59
- Issue :
- 11
- Database :
- Supplemental Index
- Journal :
- IEEE Transactions on Magnetics
- Publication Type :
- Periodical
- Accession number :
- ejs64349727
- Full Text :
- https://doi.org/10.1109/TMAG.2023.3291879