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Mitigation of EUV photoresist pattern deformation by wafer backside cleaning techniques
- Source :
- Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129570Z-129570Z-8, 1166139p
- Publication Year :
- 2024
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12957
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs66210829
- Full Text :
- https://doi.org/10.1117/12.3010976