Thin films of completely immiscible Ag-W system

Thin films of completely immiscible Ag-W system have been prepared in a wide range of composition by codeposition of pure silver and pure tungsten sputtered by two independently controlled magnetron sources. Deposition rate onto substrates (glass, alumina, sapphire, mono-Si) at room temperature was about 0, 33 nm/s, and the final film thickness was about 0, 5  m. The effects of working gas pressure, and of oxygen or aluminum incorporation upon the film structure have been examined. The chemical composition of the prepared films has been determined by the RBS technique. The structure of prepared films was examined by the XRD, GISAXS and SEM methods. No completely amorphous films have been obtained in the composition range Ag94W6-Ag12W88. A supersaturated solid solution Al(W) with the fcc structure is formed with