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Forming-Free Metal-Oxide ReRAM by Oxygen Ion Implantation Process
Authors :
Kim, Wonjoo
Hardtdegen, Alexander
Rodenbuecher, Christian
Stephan Menzel
Wouters, Dirk J.
Hoffmann-Eifert, Susanne
Buca, Dan
Waser, Rainer
Rana, Vikas
IEEE
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OpenAIRE
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ResearcherID
Accession number :
edsair.dedup.wf.001..6e6f82f74bb8cf09475cb83a139ffbc1
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