Planar Bulk+ Technology using TiN/Hf-based gate stack for Low Power Applications

Authors :: Bidal, G.
Boeuf, F.
Denorme, S.
Loubet, N.
Laviron, C.
Leverd, F.
Barnola, S.
Salvetat, T.
Cosnier, V.
Martin, F.
Grosjean, M.
Perreau, P.
Chanemougame, D.
Haendler, S.
Marin, M.
Rafik, M.
Fleury, D.
Leyris, C.
Clement, L.
Sellier, M.
Monfray, S.
Bougueon, J.
Samson, M. P.
gerard ghibaudo
Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC)
Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
Domenget, Chahla
Source :: 2008 Symposium on VLSI Technology, Hawai, USA, 2008 Symposium on VLSI Technology, Hawai, USA, Jun 2008, Hawai, United States, HAL
Publication Year :: 2008
Publisher :: HAL CCSD, 2008.
Abstract: International audience

Subjects :: [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
ComputingMilieux_MISCELLANEOUS

Language :: English
Database :: OpenAIRE
Journal :: 2008 Symposium on VLSI Technology, Hawai, USA, 2008 Symposium on VLSI Technology, Hawai, USA, Jun 2008, Hawai, United States, HAL
Accession number :: edsair.dedup.wf.001..7902df8ff7986b828b7ae97bc375b684

Tools