Back to Search
Start Over
Planar Bulk+ Technology using TiN/Hf-based gate stack for Low Power Applications
- Source :
- 2008 Symposium on VLSI Technology, Hawai, USA, 2008 Symposium on VLSI Technology, Hawai, USA, Jun 2008, Hawai, United States, HAL
- Publication Year :
- 2008
- Publisher :
- HAL CCSD, 2008.
-
Abstract
- International audience
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- 2008 Symposium on VLSI Technology, Hawai, USA, 2008 Symposium on VLSI Technology, Hawai, USA, Jun 2008, Hawai, United States, HAL
- Accession number :
- edsair.dedup.wf.001..7902df8ff7986b828b7ae97bc375b684