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Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films

Authors :
Zhu, Y. W.
Teo, C. H.
Xu, X. J.
Yu, T.
Chwee Teck Lim
Ong, C. K.
Thong, J. T. L.
Sow, C. H.
Source :
Scopus-Elsevier

Details

Database :
OpenAIRE
Journal :
Scopus-Elsevier
Accession number :
edsair.dedup.wf.001..bf0bf3f75294d21d9519845225ef1d10

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