Topographic Area Selective Deposition(TSD): a comparison between PEALD/q-ALE and PEALD/sputtering approaches

Authors :: Jaffal, Moustapha
Yeghoyan, Taguhi
Pesce, Vincent
Lefevre, Gauthier
Chaker, Ahmad
David, Sylvain
Gassilloud, Rémy
Posseme, Nicolas
Bonvalot, Marceline
Vallée, Christophe
Laboratoire des technologies de la microélectronique (LTM )
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
Source :: 7th International Atomic Layer Etching Workshop (ALE 2020), 7th International Atomic Layer Etching Workshop (ALE 2020), Jun 2020, virtuelle, France, 7th International Atomic Layer Etching Workshop (ALE 2020), Jun 2020, virtuelle, France. ⟨10.1116/6.0000969⟩
Publication Year :: 2020
Publisher :: HAL CCSD, 2020.
Abstract: International audience

Language :: English
Database :: OpenAIRE
Journal :: 7th International Atomic Layer Etching Workshop (ALE 2020), 7th International Atomic Layer Etching Workshop (ALE 2020), Jun 2020, virtuelle, France, 7th International Atomic Layer Etching Workshop (ALE 2020), Jun 2020, virtuelle, France. ⟨10.1116/6.0000969⟩
Accession number :: edsair.dedup.wf.001..edb5a6817c5e63237f0ed292a97b9e61

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