Phononic engineering of silicon using dots on the fly 'electron beam lithography and plasma etching'

Authors :: Lacatena, V.
Haras, M.
Robillard, J.F.
Monfray, S.
Skotnicki, T.
Dubois, Emmanuel
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN)
Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
Source :: 39th International Conference on Micro and Nano Engineering, MNE 2013, 39th International Conference on Micro and Nano Engineering, MNE 2013, 2013, London, United Kingdom
Publication Year :: 2013
Publisher :: HAL CCSD, 2013.

Language :: English
Database :: OpenAIRE
Journal :: 39th International Conference on Micro and Nano Engineering, MNE 2013, 39th International Conference on Micro and Nano Engineering, MNE 2013, 2013, London, United Kingdom
Accession number :: edsair.dedup.wf.001..f95455298d5414260c56b3f8ac2917b0

Tools