Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

MLA

Elsa Reichmanis, et al. “Base Additives for Use in a Single Layer 193-Nm Resist Based upon Poly(Norbornene/Maleic Anhydride/Acrylic Acid/ Tert -Butyl Acrylate).” SPIE Proceedings, Aug. 2001. EBSCOhost, https://doi.org/10.1117/12.436912.

APA

Elsa Reichmanis, Ilya L. Rushkin, Francis M. Houlihan, Donna Person, Ognian N. Dimov, & Omkaram Nalamasu. (2001). Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate). SPIE Proceedings. https://doi.org/10.1117/12.436912

Chicago

Elsa Reichmanis, Ilya L. Rushkin, Francis M. Houlihan, Donna Person, Ognian N. Dimov, and Omkaram Nalamasu. 2001. “Base Additives for Use in a Single Layer 193-Nm Resist Based upon Poly(Norbornene/Maleic Anhydride/Acrylic Acid/ Tert -Butyl Acrylate).” SPIE Proceedings, August. doi:10.1117/12.436912.