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Spectroscopic differentiation between O-atom vacancy and divacancy defects, respectively, in TiO2 and HfO2 by X-ray absorption spectroscopy
- Source :
- Microelectronic Engineering. 86:1676-1679
- Publication Year :
- 2009
- Publisher :
- Elsevier BV, 2009.
-
Abstract
- Defect state features have been detected in second derivative O K edge spectra for thin films of nano-crystalline TiO"2 and HfO"2. Based on soft X-ray photoelectron band edge spectra, and the occurrence of occupied band edge 4f states in Gd(Sc,Ti)O"3, complementary spectroscopic features have been confirmed in the pre-edge ( 545eV) regimes of O K edge spectra. Qualitatively similar spectral features have been obtained for thin films of HfO"2 and TiO"2, and these have been assigned to defect states associated with vacancies. The two electrons/removed O-atom are not distributed uniformly over the TM atoms defining the vacancy geometry, but instead are localized in equivalent d-states: a d^2 state for a Ti monovacancy and a d^4 state for a Hf divacancy. This new model for electronic structure provides an unambiguous way to differentiate between monovacancy and divacancy arrangements, as well as immobile (or fixed) and mobile vacancies.
- Subjects :
- X-ray absorption spectroscopy
Chemistry
Electron
Electronic structure
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Spectral line
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
K-edge
Vacancy defect
Atom
Electrical and Electronic Engineering
Thin film
Atomic physics
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 86
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........019b4364951f7bb8fe94c2e4d43003e0
- Full Text :
- https://doi.org/10.1016/j.mee.2009.03.005