Stoichiometric Control of SiOxThin Films Grown by Reactive Magnetron Sputtering at Oblique Angles

Authors :: Ramón Escobar-Galindo
Aurelio García-Valenzuela
Agustín R. González-Elipe
Elena Guillén
Rafael Alvarez
Carmen López-Santos
Francisco J. Ferrer
Víctor J. Rico
Mercedes Alcon-Camas
Alberto Palmero
Source :: Plasma Processes and Polymers. 13:1242-1248
Publication Year :: 2016
Publisher :: Wiley, 2016.
Abstract: The authors thank the Junta de Andalucia (P12-FQM-2265) and the Spanish Ministry of Economy and Competitiveness (Projects MAT2013-42900-P, MAT2013-40852-R, MINECO-CSIC 201560E055) for financial support.

Subjects :: 010302 applied physics
Reactive magnetron
Materials science
Polymers and Plastics
Oblique case
02 engineering and technology
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
Engineering physics
Sputtering
0103 physical sciences
Christian ministry
Thin film
0210 nano-technology
Silicon oxide
Stoichiometry

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