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Effect of double-pulse-laser polarization and time delay on laser-assisted etching of fused silica
- Source :
- Journal of Physics D: Applied Physics. 50:465306
- Publication Year :
- 2017
- Publisher :
- IOP Publishing, 2017.
-
Abstract
- High-aspect-ratio microchannels were fabricated by femtosecond-double-pulse-laser-assisted polarization-selective etching. The etching rate and uniformity of the microchannels were mainly determined by the double-pulse polarization and time delay. We found that when the two sub-pulses had a different polarization (one linear, the other circular), the microchannel etching rate increased by a factor of 10 compared to when both sub-pulses were linearly polarized. The maximum etching rate was obtained when the polarization combination was circular for the first sub-pulse and vertical for the second one. In this case, the etching rate was independent from the time delay. Laser confocal microscopy images showed that when the polarization was circular, the area modified by the laser was larger than when the polarization was linear, explaining the higher etching rate value obtained after irradiation with circularly polarized laser light.
- Subjects :
- Materials science
Acoustics and Ultrasonics
Physics::Instrumentation and Detectors
02 engineering and technology
01 natural sciences
Double pulse
law.invention
010309 optics
Laser polarization
law
0103 physical sciences
Irradiation
Microchannel
Linear polarization
business.industry
technology, industry, and agriculture
021001 nanoscience & nanotechnology
Condensed Matter Physics
Laser assisted
Laser
Polarization (waves)
Computer Science::Other
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Optoelectronics
0210 nano-technology
business
Subjects
Details
- ISSN :
- 13616463 and 00223727
- Volume :
- 50
- Database :
- OpenAIRE
- Journal :
- Journal of Physics D: Applied Physics
- Accession number :
- edsair.doi...........03ae92fd918c3d72284888af90e15837