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Instability of Polystyrene Film and Thermal Behaviors Mediated by Unfavorable Silicon Oxide Interlayer

Authors :
Jong Hak Kim
Hoyeon Lee
Keiji Tanaka
Norifumi L. Yamada
Seungjae Lee
Wooseop Lee
Du Yeol Ryu
Source :
Macromolecules. 52:7524-7530
Publication Year :
2019
Publisher :
American Chemical Society (ACS), 2019.

Abstract

Instability, glass transition temperature (Tg), and thermal expansion of polystyrene (PS) films are evaluated with respect to the thickness of a silicon oxide (SiOx) interlayer that mediates favora...

Details

ISSN :
15205835 and 00249297
Volume :
52
Database :
OpenAIRE
Journal :
Macromolecules
Accession number :
edsair.doi...........04b02a77d2ae05eb7d2d18dc758c7f5b
Full Text :
https://doi.org/10.1021/acs.macromol.9b01284