Tunability of Parasitic Channel in Gate-All-Around Stacked Nanosheets

For the first time, a comprehensive study going from the integration of 3D stacked nanosheets Gate-All-Around (GAA) MOSFET devices to SPICE modeling is proposed. Devices have been successfully fabricated on SOI substrates using a replacement high- $\kappa$ metal gate process and self-aligned-contacts. Back-biasing is herein efficiently used to highlight a drastic improvement of electrostatics in the upper GAA Si channels. Advanced electrical characterization of these devices enabled us to calibrate a new version of physical compact model (LETI-NSP) in order to assess the performance of ring oscillators for different configurations of GAA FETs integrating up to 8 vertically stacked Si channels.