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Extremely Scaled Si and Ge to L g = 3-nm FinFETs and L g = 1-nm Ultra-Thin Body Junctionless FET Simulation

Authors :
Yung-Chun Wu
Yi-Ruei Jhan
Source :
3D TCAD Simulation for CMOS Nanoeletronic Devices ISBN: 9789811030659
Publication Year :
2017
Publisher :
Springer Singapore, 2017.

Abstract

Huge efforts are put into CMOS scaling to push the limits of Moore’s law. Semiconductor ICs manufacturing companies are currently ramping up 16-nm/14-nm FinFET processes, with 7 and 5 nm just around the corner.

Details

ISBN :
978-981-10-3065-9
ISBNs :
9789811030659
Database :
OpenAIRE
Journal :
3D TCAD Simulation for CMOS Nanoeletronic Devices ISBN: 9789811030659
Accession number :
edsair.doi...........06f7bc662a77e86569af162a0fb150ad
Full Text :
https://doi.org/10.1007/978-981-10-3066-6_8