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Extremely Scaled Si and Ge to L g = 3-nm FinFETs and L g = 1-nm Ultra-Thin Body Junctionless FET Simulation
- Source :
- 3D TCAD Simulation for CMOS Nanoeletronic Devices ISBN: 9789811030659
- Publication Year :
- 2017
- Publisher :
- Springer Singapore, 2017.
-
Abstract
- Huge efforts are put into CMOS scaling to push the limits of Moore’s law. Semiconductor ICs manufacturing companies are currently ramping up 16-nm/14-nm FinFET processes, with 7 and 5 nm just around the corner.
Details
- ISBN :
- 978-981-10-3065-9
- ISBNs :
- 9789811030659
- Database :
- OpenAIRE
- Journal :
- 3D TCAD Simulation for CMOS Nanoeletronic Devices ISBN: 9789811030659
- Accession number :
- edsair.doi...........06f7bc662a77e86569af162a0fb150ad
- Full Text :
- https://doi.org/10.1007/978-981-10-3066-6_8