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Low‐temperature curable, alkaline‐developable, and negative‐type photosensitive polyimide with high resolution and mechanical properties based on chain extendable poly(amic acid) and photo‐base generator

Authors :
Yao Ming Yeh
Mitsuru Ueda
Chain-Shu Hsu
Vamsi Krishna Karapala
Source :
Polymers for Advanced Technologies. 32:663-669
Publication Year :
2020
Publisher :
Wiley, 2020.

Details

ISSN :
10991581 and 10427147
Volume :
32
Database :
OpenAIRE
Journal :
Polymers for Advanced Technologies
Accession number :
edsair.doi...........0b07ba009b7fd85121109cfea3a81f16
Full Text :
https://doi.org/10.1002/pat.5119