GeSn Technology: Impact of Sn on Ge CMOS Applications

MLA

Shigeaki Zaima, et al. “GeSn Technology: Impact of Sn on Ge CMOS Applications.” ECS Meeting Abstracts, Aug. 2011, p. 2132. EBSCOhost, https://doi.org/10.1149/ma2011-02/32/2132.

APA

Shigeaki Zaima, Osamu Nakatsuka, Yosuke Shimura, Shotaro Takeuchi, Benjamin Vincent, Federica Gencarelli, Trudy Clarysse, Jelle Demeulemeester, Kristiaan Temst, Andre Vantomme, Matty Caymax, & Roger Loo. (2011). GeSn Technology: Impact of Sn on Ge CMOS Applications. ECS Meeting Abstracts, 2132. https://doi.org/10.1149/ma2011-02/32/2132

Chicago

Shigeaki Zaima, Osamu Nakatsuka, Yosuke Shimura, Shotaro Takeuchi, Benjamin Vincent, Federica Gencarelli, Trudy Clarysse, et al. 2011. “GeSn Technology: Impact of Sn on Ge CMOS Applications.” ECS Meeting Abstracts, August, 2132. doi:10.1149/ma2011-02/32/2132.