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Photosensitive Hypervalent Fluorinated Sulfur Containing Polymers for Light Sensitive Applications

Authors :
Linbin Zhong
Michael C. Murphy
Robert L. Brainard
Kelly A. Bonetti
John T. Welch
Source :
Journal of Polymer Science. 58:787-791
Publication Year :
2020
Publisher :
Wiley, 2020.

Details

ISSN :
26424169 and 26424150
Volume :
58
Database :
OpenAIRE
Journal :
Journal of Polymer Science
Accession number :
edsair.doi...........1140c4e0cf8b3b11c3f76f33d07c45e0
Full Text :
https://doi.org/10.1002/pol.20190104