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Aluminum thin film growth by the thermal decomposition of triethylamine alane
- Source :
- Surface Science. 244:89-95
- Publication Year :
- 1991
- Publisher :
- Elsevier BV, 1991.
-
Abstract
- Triethylamine alane (TEAA) decomposes on an Al(111) single crystal surface at temperatures above ∼310 K to yield pure aluminum thin films, liberating hydrogen and triethylamine into the gas phase. Aluminum deposition is epitaxial and clean (no carbon or nitrogen containing species are observed by Auger electron spectroscopy). The film growth rate is limited by the rate of the recombinative desorption of hydrogen from the surface. These results are compared to similar data from experiments on the surface-mediated thermal decomposition of trimethylamine alane.
- Subjects :
- Auger electron spectroscopy
Hydrogen
Inorganic chemistry
Thermal decomposition
chemistry.chemical_element
Crystal growth
Surfaces and Interfaces
Condensed Matter Physics
Surfaces, Coatings and Films
chemistry.chemical_compound
chemistry
Desorption
Materials Chemistry
Thin film
Triethylamine
Single crystal
Subjects
Details
- ISSN :
- 00396028
- Volume :
- 244
- Database :
- OpenAIRE
- Journal :
- Surface Science
- Accession number :
- edsair.doi...........11ee2b5494b630004648f4e1343c6fc2