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Time-Resolved Magnetization Dynamics and Damping Constant of Sputtered Co/Ni Multilayers
- Source :
- IEEE Transactions on Magnetics. 47:3036-3039
- Publication Year :
- 2011
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2011.
-
Abstract
- Co/Ni multilayers with a stack of Ta (2 nm)/[Co (tCo)/Ni (tNi)] N/Ta (30 nm) were prepared by dc magnetron sputtering, and their magnetization dynamics were measured by time-resolved magneto-optical Kerr effect (TRMOKE). The total thickness of the multilayer and perpendicular anisotropy were varied by changing the bilayer period d = tCo+ tNi and number of repeats N while tNi/tCo was kept at a constant of 2.5. The TRMOKE measurements show clear damped oscillation of the magnetization of Co/Ni multilayers after the pump pulse illumination, and the damping constant α of the Co/Ni multilayers was estimated from the TRMOKE waveform. The estimated α was found to be independent both on total thickness and anisotropy field of the multilayer and was estimated to be ~ 0.035 for all the multilayers. This means that the use of Ta capping and buffer layers is effective to evaluate intrinsic damping constant of the Co/Ni multilayer, and that independent control of α and perpendicular anisotropy are possible for the magnetic multilayers.
- Subjects :
- Magnetization dynamics
Materials science
Kerr effect
Condensed matter physics
Magnetoresistance
Bilayer
Computer Science::Neural and Evolutionary Computation
Tantalum
Physics::Optics
chemistry.chemical_element
Sputter deposition
Electronic, Optical and Magnetic Materials
Condensed Matter::Materials Science
Magnetization
chemistry
Electrical and Electronic Engineering
Anisotropy
Subjects
Details
- ISSN :
- 19410069 and 00189464
- Volume :
- 47
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Magnetics
- Accession number :
- edsair.doi...........126283e44a3992b4929c654970b1f5ac
- Full Text :
- https://doi.org/10.1109/tmag.2011.2158082