Cite
High-throughput study of the anodic oxidation of Hf–Ti thin films
MLA
Alfred Ludwig, et al. “High-Throughput Study of the Anodic Oxidation of Hf–Ti Thin Films.” Electrochimica Acta, vol. 54, Sept. 2009, pp. 5171–78. EBSCOhost, https://doi.org/10.1016/j.electacta.2009.01.016.
APA
Alfred Ludwig, Andrei Ionut Mardare, Alan Savan, Andreas D. Wieck, & Achim Walter Hassel. (2009). High-throughput study of the anodic oxidation of Hf–Ti thin films. Electrochimica Acta, 54, 5171–5178. https://doi.org/10.1016/j.electacta.2009.01.016
Chicago
Alfred Ludwig, Andrei Ionut Mardare, Alan Savan, Andreas D. Wieck, and Achim Walter Hassel. 2009. “High-Throughput Study of the Anodic Oxidation of Hf–Ti Thin Films.” Electrochimica Acta 54 (September): 5171–78. doi:10.1016/j.electacta.2009.01.016.