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Influence of Ge substrate orientation on crystalline structures of Ge1−Sn epitaxial layers
- Source :
- Thin Solid Films. 557:159-163
- Publication Year :
- 2014
- Publisher :
- Elsevier BV, 2014.
-
Abstract
- We have investigated the substrate orientation dependence of the crystallinity and strain relaxation behavior of Ge and Ge 1 − x Sn x layers epitaxially grown on Ge(001), (110), and (111) substrates. The strain relaxation in Ge 1 − x Sn x layers on Ge(110) and (111) occurs from a strain value smaller than that on Ge(001). We obtained the critical strain energy of a Ge 1 − x Sn x layer regardless of Ge substrate orientation. As a result, we achieved the epitaxial growth of pseudomorphic Ge 1 − x Sn x layers with high substitutional Sn contents of 8.5% and 6.7% on Ge(110) and (111) substrates, respectively.
- Subjects :
- Materials science
Condensed matter physics
Relaxation (NMR)
Metals and Alloys
chemistry.chemical_element
Germanium
Surfaces and Interfaces
Substrate (electronics)
Epitaxy
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Strain energy
Crystallinity
Crystallography
chemistry
Materials Chemistry
Tin
Layer (electronics)
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 557
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........143b7afb36157deed7e4dec073e28916
- Full Text :
- https://doi.org/10.1016/j.tsf.2013.10.087