Superresolution lithography from the viewpoint of partially coherent imaging theory Part II: Isolated structures

MLA

R. Hild, et al. “Superresolution Lithography from the Viewpoint of Partially Coherent Imaging Theory Part II: Isolated Structures.” Microelectronic Engineering, vol. 26, Apr. 1995, pp. 93–106. EBSCOhost, https://doi.org/10.1016/0167-9317(94)00043-t.

APA

R. Hild, G. Nitzsche, & U. Altenburger. (1995). Superresolution lithography from the viewpoint of partially coherent imaging theory Part II: Isolated structures. Microelectronic Engineering, 26, 93–106. https://doi.org/10.1016/0167-9317(94)00043-t

Chicago

R. Hild, G. Nitzsche, and U. Altenburger. 1995. “Superresolution Lithography from the Viewpoint of Partially Coherent Imaging Theory Part II: Isolated Structures.” Microelectronic Engineering 26 (April): 93–106. doi:10.1016/0167-9317(94)00043-t.