Cite
Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method
MLA
Y.R. Jia, et al. “Deposition of Bi3.15Nd0.85Ti3O12 Ferroelectric Thin Films on 5-Inch Diameter Si Wafers by a Modified Pulsed Laser Deposition Method.” Thin Solid Films, vol. 591, Sept. 2015, pp. 126–30. EBSCOhost, https://doi.org/10.1016/j.tsf.2015.08.009.
APA
Y.R. Jia, J. B. Wang, S. Li, Y. C. Zhou, Congbing Tan, Zhong Xiangli, & B. Li. (2015). Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method. Thin Solid Films, 591, 126–130. https://doi.org/10.1016/j.tsf.2015.08.009
Chicago
Y.R. Jia, J. B. Wang, S. Li, Y. C. Zhou, Congbing Tan, Zhong Xiangli, and B. Li. 2015. “Deposition of Bi3.15Nd0.85Ti3O12 Ferroelectric Thin Films on 5-Inch Diameter Si Wafers by a Modified Pulsed Laser Deposition Method.” Thin Solid Films 591 (September): 126–30. doi:10.1016/j.tsf.2015.08.009.