Research on the resolution of submicron lithographic projection system based on DMD for optical fiber end face

We report a direct and facile method to study the limit resolution of optical fiber microlithography, which is based on DMD (digital micromirror device) the fiber end face of submicron uv lithography system, with 365 nm uv light, supplemented by 620–630 nm red light for focusing the reference light source, using the Reduced projection objective lens will focus the DMD modulation of the ultraviolet light on the spin of the photoresist fiber end face, realize the optical fiber end surface microstructure (single exposure precision 900 nanometers, single exposure area of more than hundred microns) preparation. By changing the magnification of the objective and Number of pixels in a single cycle of digital mask, the influence of the Objectives with different magnification and the pixel point on the precision and integrity of the microstructure was analyzed, and the lithography experiment was carried out to verify and get the optimal solution between the two factors.