Back to Search
Start Over
Selective Dissolution Resistance Control of EUV Photoresist Using Multiscale Simulation: Rational Design of Hybrid System
- Source :
- Macromolecules. 53:4748-4763
- Publication Year :
- 2020
- Publisher :
- American Chemical Society (ACS), 2020.
-
Abstract
- A photoresist (PR) that can be fabricated in sub-10 nm patterns with the introduction of extreme ultraviolet lithography (EUVL) is a key requirement for transistor downsizing. To produce such ultra...
- Subjects :
- Materials science
Polymers and Plastics
business.industry
Extreme ultraviolet lithography
Organic Chemistry
Transistor
Rational design
02 engineering and technology
Photoresist
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
law.invention
Inorganic Chemistry
law
Hybrid system
Materials Chemistry
Optoelectronics
0210 nano-technology
business
Dissolution
Subjects
Details
- ISSN :
- 15205835 and 00249297
- Volume :
- 53
- Database :
- OpenAIRE
- Journal :
- Macromolecules
- Accession number :
- edsair.doi...........1ac1288b8027899e872f3f754ac69804
- Full Text :
- https://doi.org/10.1021/acs.macromol.9b02378