Concentration and structural inhomogeneities in highly doped GaSb(Si) single crystals

Concentration and structural inhomogeneities in highly doped GaSb(Si) single crystals grown under various conditions of heat and mass transfer are studied by methods of X-ray topography, high-resolution X-ray diffractometry, and digital image processing. It is established that the inhomogeneity of crystals is determined by specific features of impurity microsegregation during growth under conditions of nonstationary convection in a melt and by peculiarities of the dislocation structure of crystals. The processes related to the initial stage of the decay of the Si supersaturated solid solution in GaSb contribute considerably to the inhomogeneity of crystals on the micro- and macrolevels.