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Effect of oblique angle on dynamic magnetic properties of FeSiAl–SiO2 thin films fabricated by oblique co-sputtering method
- Source :
- Journal of Materials Science: Materials in Electronics. 28:4570-4576
- Publication Year :
- 2016
- Publisher :
- Springer Science and Business Media LLC, 2016.
-
Abstract
- In this work, we investigate the dynamic magnetic properties and their thermostability in the temperature range of 300 to 420 K for FeSiAl–SiO2 thin films fabricated by hybrid oblique co-sputtering technique systematically. The magnetic anisotropy field HK and ferromagnetic resonance frequency fFMR can be tuned from 14.66 to 85.32 Oe and 1.13 to 2.62 GHz respectively, by adjusting the oblique angle β, which can be elucidated with respect to the contribution of reinforced shape and stress-induced anisotropies. Moreover, the thermostability of FeSiAl–SiO2 films in terms of HK and fFMR are enhanced with the increase of β up to 35° while the thermostability of effective Gilbert damping factor αeff and the maximum imaginary permeability μ″max are enhanced with the increasing of β up to 45° and the involved mechanisms are analyzed in detail.
- Subjects :
- 010302 applied physics
Materials science
business.industry
02 engineering and technology
Atmospheric temperature range
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
Ferromagnetic resonance
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
Magnetic anisotropy
Optics
Sputtering
Permeability (electromagnetism)
0103 physical sciences
Electrical and Electronic Engineering
Composite material
Thin film
0210 nano-technology
business
Anisotropy
Thermostability
Subjects
Details
- ISSN :
- 1573482X and 09574522
- Volume :
- 28
- Database :
- OpenAIRE
- Journal :
- Journal of Materials Science: Materials in Electronics
- Accession number :
- edsair.doi...........1c6138b6317f3645909dc69a1ec294b1
- Full Text :
- https://doi.org/10.1007/s10854-016-6093-x