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Effect of oblique angle on dynamic magnetic properties of FeSiAl–SiO2 thin films fabricated by oblique co-sputtering method

Authors :
Lezhong Li
Xiao-Xi Zhong
Rui Wang
Xiao-Qiang Tu
Source :
Journal of Materials Science: Materials in Electronics. 28:4570-4576
Publication Year :
2016
Publisher :
Springer Science and Business Media LLC, 2016.

Abstract

In this work, we investigate the dynamic magnetic properties and their thermostability in the temperature range of 300 to 420 K for FeSiAl–SiO2 thin films fabricated by hybrid oblique co-sputtering technique systematically. The magnetic anisotropy field HK and ferromagnetic resonance frequency fFMR can be tuned from 14.66 to 85.32 Oe and 1.13 to 2.62 GHz respectively, by adjusting the oblique angle β, which can be elucidated with respect to the contribution of reinforced shape and stress-induced anisotropies. Moreover, the thermostability of FeSiAl–SiO2 films in terms of HK and fFMR are enhanced with the increase of β up to 35° while the thermostability of effective Gilbert damping factor αeff and the maximum imaginary permeability μ″max are enhanced with the increasing of β up to 45° and the involved mechanisms are analyzed in detail.

Details

ISSN :
1573482X and 09574522
Volume :
28
Database :
OpenAIRE
Journal :
Journal of Materials Science: Materials in Electronics
Accession number :
edsair.doi...........1c6138b6317f3645909dc69a1ec294b1
Full Text :
https://doi.org/10.1007/s10854-016-6093-x