Deep photo-lithography characterization of SU-8 resist layers

MLA

H. Hein, et al. “Deep Photo-Lithography Characterization of SU-8 Resist Layers.” Microsystem Technologies, vol. 11, Apr. 2005, pp. 282–91. EBSCOhost, https://doi.org/10.1007/s00542-004-0432-1.

APA

H. Hein, Jürgen Mohr, & E. F. Reznikova. (2005). Deep photo-lithography characterization of SU-8 resist layers. Microsystem Technologies, 11, 282–291. https://doi.org/10.1007/s00542-004-0432-1

Chicago

H. Hein, Jürgen Mohr, and E. F. Reznikova. 2005. “Deep Photo-Lithography Characterization of SU-8 Resist Layers.” Microsystem Technologies 11 (April): 282–91. doi:10.1007/s00542-004-0432-1.