Use of a rapid anneal to improve CaF2:Si (100) epitaxy

MLA

Loren Pfeiffer, et al. “Use of a Rapid Anneal to Improve CaF2:Si (100) Epitaxy.” Applied Physics Letters, vol. 46, May 1985, pp. 947–49. EBSCOhost, https://doi.org/10.1063/1.95830.

APA

Loren Pfeiffer, Julia M. Phillips, T. P. Smith, K. W. West, & W. M. Augustyniak. (1985). Use of a rapid anneal to improve CaF2:Si (100) epitaxy. Applied Physics Letters, 46, 947–949. https://doi.org/10.1063/1.95830

Chicago

Loren Pfeiffer, Julia M. Phillips, T. P. Smith, K. W. West, and W. M. Augustyniak. 1985. “Use of a Rapid Anneal to Improve CaF2:Si (100) Epitaxy.” Applied Physics Letters 46 (May): 947–49. doi:10.1063/1.95830.